MPS2100是查普曼仪器公司的高分辨率分析仪。用于表面测量和分析，它既可以用作在线质量检查的生产工具，也可以用作建立标准和研究公差的研发工具。MPS2100采用非接触测量技术，用户可以快速进行高分辨率线性或圆形扫描。非接触测量系统可在单个系统中测量多个参数(Surface Waviness, Surface Roughness ,Roll Off )基于Windows®的操作软件可以通过编程来执行一系列例行程序，并报告在线生产数据以供进一步分析。
System Features
• 200 and 300 mm capability
• Measurement at any location on backgrind wafer (200 or 300 mm)
• Integrated CCD Nomarski Viewing System
• Complete 360o Circular Scan on wafer surface
• Autofocus/Auto tracking
• Programmable sample positioning
• Automated notch or flat finder
• Automated event logging and viewing
• Robotic Handler (200 or 300mm wafer，Options)
Performance Specifications
• Vertical Resolution: Better than 0.1 nm
• Horizontal Resolution: 0.5 μm
• Linear Scan Length: Up to 100 mm
• Circular Scan Length: Complete circumference of wafer
• X and Y Stage Resolution: 1 μm
• Theta Stage Resolution: 0.001 Degree
• Data Sampling 50 nm (minimum)